2017.7-2020.9 中芯国际上海集成电路有限公司

2024.7-2025.4 中国工程物理研究院电子工程研究所

2025.4-至今  无锡学院

CMOS集成电路设计、半导体材料

[1]Yan Teng,Kun Tang*,et al,“High efficiency of boron doping and fast growth realized with a novel gas inlet structure indiamond microwave plasma chemical vapor deposition system”,Carbon Lett.34, 1115 (2024).

[2]Yan Teng,Kun Tang*,et al,“Substrate Temperature Dependence of the Contribution Rate of Nitrogen to Diamond Growth byMicrowave Plasma CVD”,Diamond Relat.Mater.146,111181 (2024).

[3]Yan Teng,Kun Tang*,et al,“The regulation mechanism of oxygen additives on diamond growth and residual boron by microwave plasma chemical vapor deposition”,Diamond Relat.Mater.160, 113065 (2025).